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9780471966814

Semiconductor Micromachining, Fundamental Electrochemistry and Physics

by ;
  • ISBN13:

    9780471966814

  • ISBN10:

    0471966819

  • Edition: 1st
  • Format: Hardcover
  • Copyright: 1998-05-08
  • Publisher: Wiley
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Supplemental Materials

What is included with this book?

Summary

Semiconductor Micromachining - Fundamentals and Technology - is a two volume work in which, for the first time, the various disciplines associated with the theory and practice of device fabrication are brought together in one comprehensive reference source. Volume 1 contains a detailed coverage of semiconductor electrochemistry and physics whilst Volume 2 describes the wide range of microengineering technologies with details of practical applications. The authors for each chapter have been carefully selected for their expertise and are acknowledged leaders in their respective fields. The purpose of this book is to enable workers in the area of semiconductor micromachining to have ready access to the basic literature, essential to provide a solid basis for the many different aspects of physics, chemistry, electronics and engineering involved with this technology. The main focus of the book is on structures based on silicon, the most common and versatile of the current range of commercially available semiconductors, but other materials such as IIIA'A-V semiconductors are also considered. Together these two volumes provide an indispensable reference text for this fast growing area of applied science. It will be of value to a wide range of academic and industrial scientists, technologists and engineers who wish to expand their knowledge in this area of science and for whom thus far, there has been no convenient reference work. Volume 2: Techniques and Industrial Applications

Author Biography

S. A. Campbell is the editor of Semiconductor Micromachining, Volume 1, Fundamental Electrochemistry and Physics, published by Wiley. H. J. Lewerenz is the editor of Semiconductor Micromachining, Volume 1, Fundamental Electrochemistry and Physics, published by Wiley.

Table of Contents

List of Contributors ix(2)
Preface xi(2)
Acknowledgements xiii
Chapter 1 Electrochemical and Photochemical Properties of Semiconductors
1(34)
S.R. Morrison
Chapter 2 Chemical and Electrochemical Etching of Semiconductors
35(58)
J.J. Kelly
D. Vanmaekelbergh
Chapter 3 Photoetching of III-V Semiconductors: Basic Photoelectrochemical Principles
93(46)
W. Plieth
S. Wetzenstein
Chapter 4 Influence of Photoelectrochemical Etching on Electronic Properties of Semiconductor Surfaces
139(38)
R. Tenne
Chapter 5 Surface Conditioning of Silicon by Photoelectrochemical Etching
177(40)
C. Levy-Clement
Chapter 6 Electrochemical Conditioning of Silicon: Surface Analyses and Electronic Implications
217(60)
H.J. Lewerenz
H. Jungblut
Chapter 7 The Formation of Porous Silicon
277(32)
D.J. Riley
Index 309

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